As designs transition from 130nm to 90nm and below, designers must consider manufacturing effects early in the design cycle. Shrinking design nodes, larger designs, and expanding design complexity ...

There are have been numerous papers written on the techniques that can be employed during integrated circuit (IC) design to achieve better overall manufacturability and yield. These ...

With nanometer processes, silicon success depends on the designer's ability to anticipate manufacturing concerns before tapeout. To achieve acceptable yield (or even working silicon), designers must ...

Diagnosis-driven yield analysis identifies the cause of systematic yield loss to speed yield ramp on new processes and improves yield on mature processes. Finding the root cause of yield loss is ...